SEMI-PointRend: Improved Semiconductor Wafer Defect Classification and Segmentation as Rendering

• URL: http://arxiv.org/abs/2302.09569v1
• Date: Sun, 19 Feb 2023 13:12:28 GMT
• Title: SEMI-PointRend: Improved Semiconductor Wafer Defect Classification and Segmentation as Rendering
• Authors: MinJin Hwang, Bappaditya Dey, Enrique Dehaerne, Sandip Halder, Young-han Shin
• Abstract summary: PointRend is an iterative segmentation algorithm inspired by image rendering in computer graphics. We show that SEMI-PointRend can outperforms Mask R-CNN by up to 18.8% in terms of segmentation mean average precision.
• Score: 0.31317409221921133
• License: http://creativecommons.org/licenses/by-nc-nd/4.0/
• Abstract: In this study, we applied the PointRend (Point-based Rendering) method to semiconductor defect segmentation. PointRend is an iterative segmentation algorithm inspired by image rendering in computer graphics, a new image segmentation method that can generate high-resolution segmentation masks. It can also be flexibly integrated into common instance segmentation meta-architecture such as Mask-RCNN and semantic meta-architecture such as FCN. We implemented a model, termed as SEMI-PointRend, to generate precise segmentation masks by applying the PointRend neural network module. In this paper, we focus on comparing the defect segmentation predictions of SEMI-PointRend and Mask-RCNN for various defect types (line-collapse, single bridge, thin bridge, multi bridge non-horizontal). We show that SEMI-PointRend can outperforms Mask R-CNN by up to 18.8% in terms of segmentation mean average precision.

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