One Model For All: Partial Diffusion for Unified Try-On and Try-Off in Any Pose

• URL: http://arxiv.org/abs/2508.04559v1
• Date: Wed, 06 Aug 2025 15:46:01 GMT
• Title: One Model For All: Partial Diffusion for Unified Try-On and Try-Off in Any Pose
• Authors: Jinxi Liu, Zijian He, Guangrun Wang, Guanbin Li, Liang Lin,
• Abstract summary: We introduce textbfOMFA (emphOne Model For All), a unified diffusion framework for both virtual try-on and try-off.<n>The framework is entirely mask-free and requires only a single portrait and a target pose as input.<n>It achieves state-of-the-art results on both try-on and try-off tasks, providing a practical and generalizable solution for virtual garment synthesis.
• Score: 99.056324701764
• License: http://arxiv.org/licenses/nonexclusive-distrib/1.0/
• Abstract: Recent diffusion-based approaches have made significant advances in image-based virtual try-on, enabling more realistic and end-to-end garment synthesis. However, most existing methods remain constrained by their reliance on exhibition garments and segmentation masks, as well as their limited ability to handle flexible pose variations. These limitations reduce their practicality in real-world scenarios-for instance, users cannot easily transfer garments worn by one person onto another, and the generated try-on results are typically restricted to the same pose as the reference image. In this paper, we introduce \textbf{OMFA} (\emph{One Model For All}), a unified diffusion framework for both virtual try-on and try-off that operates without the need for exhibition garments and supports arbitrary poses. For example, OMFA enables removing garments from a source person (try-off) and transferring them onto a target person (try-on), while also allowing the generated target to appear in novel poses-even without access to multi-pose images of that person. OMFA is built upon a novel \emph{partial diffusion} strategy that selectively applies noise and denoising to individual components of the joint input-such as the garment, the person image, or the face-enabling dynamic subtask control and efficient bidirectional garment-person transformation. The framework is entirely mask-free and requires only a single portrait and a target pose as input, making it well-suited for real-world applications. Additionally, by leveraging SMPL-X-based pose conditioning, OMFA supports multi-view and arbitrary-pose try-on from just one image. Extensive experiments demonstrate that OMFA achieves state-of-the-art results on both try-on and try-off tasks, providing a practical and generalizable solution for virtual garment synthesis. The project page is here: https://onemodelforall.github.io/.

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