Functional surface ion traps on a 12-inch glass wafer for quantum
applications
- URL: http://arxiv.org/abs/2002.11470v1
- Date: Wed, 26 Feb 2020 13:38:49 GMT
- Title: Functional surface ion traps on a 12-inch glass wafer for quantum
applications
- Authors: J Tao, J Likforman, P Zhao, H. Li, T Henner, Y Lim, W Seit, Luca
Guidoni, C Tan
- Abstract summary: We report large-scale fabrication of perfectly functional radio frequency (RF) surface ion traps on a 12-inch glass substrate.
The ion lifetime is on the order of 30 minutes for a pressure in the vacuum chamber of 5 x 10-11 mbar.
- Score: 0.0
- License: http://arxiv.org/licenses/nonexclusive-distrib/1.0/
- Abstract: We report large-scale fabrication of perfectly functional radio frequency
(RF) surface ion traps on a 12-inch glass substrate with a standard
CMOS-compatible backend process. Established 12-inch foundry backend process of
electroplated Cu with Au finish are employed to fabricate the surface
electrodes directly on the glass wafer substrate. We tested a trap by loading
it with laser-cooled 88 Sr + ions. The trap shows a stable operation with RF
amplitude in the range 100-230 V at 33 MHz frequency. The ion lifetime is on
the order of 30 minutes for a pressure in the vacuum chamber of 5 x 10-11 mbar,
which demonstrates an exciting potential for future implementation of quantum
computing system with a standard foundry process on CMOS compatible and
cost-effective platform.
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