Unitho: A Unified Multi-Task Framework for Computational Lithography

• URL: http://arxiv.org/abs/2511.10255v2
• Date: Fri, 14 Nov 2025 06:52:44 GMT
• Title: Unitho: A Unified Multi-Task Framework for Computational Lithography
• Authors: Qian Jin, Yumeng Liu, Yuqi Jiang, Qi Sun, Cheng Zhuo,
• Abstract summary: Unitho is a unified multi-task large vision model built upon the Transformer architecture.<n>Unitho supports end-to-end mask generation, lithography simulation, and rule violation detection.
• Score: 16.967730364271393
• License: http://creativecommons.org/licenses/by-nc-nd/4.0/
• Abstract: Reliable, generalizable data foundations are critical for enabling large-scale models in computational lithography. However, essential tasks-mask generation, rule violation detection, and layout optimization-are often handled in isolation, hindered by scarce datasets and limited modeling approaches. To address these challenges, we introduce Unitho, a unified multi-task large vision model built upon the Transformer architecture. Trained on a large-scale industrial lithography simulation dataset with hundreds of thousands of cases, Unitho supports end-to-end mask generation, lithography simulation, and rule violation detection. By enabling agile and high-fidelity lithography simulation, Unitho further facilitates the construction of robust data foundations for intelligent EDA. Experimental results validate its effectiveness and generalizability, with performance substantially surpassing academic baselines.

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