Quantum Imaging for Semiconductor Industry
- URL: http://arxiv.org/abs/2006.12734v1
- Date: Tue, 23 Jun 2020 04:06:13 GMT
- Title: Quantum Imaging for Semiconductor Industry
- Authors: Anna V. Paterova, Hongzhi Yang, Zi S. D. Toa, Leonid A. Krivitsky
- Abstract summary: Infrared (IR) imaging is one of the significant tools for the quality control measurements of fabricated samples.
Due to the limited choices of IR light sources or detectors, challenges in reaching specific IR wavelengths may arise.
In our work, we perform indirect IR microscopy based on the quantum imaging technique.
- Score: 0.5735035463793008
- License: http://arxiv.org/licenses/nonexclusive-distrib/1.0/
- Abstract: Infrared (IR) imaging is one of the significant tools for the quality control
measurements of fabricated samples. Standard IR imaging techniques use direct
measurements, where light sources and detectors operate at IR range. Due to the
limited choices of IR light sources or detectors, challenges in reaching
specific IR wavelengths may arise. In our work, we perform indirect IR
microscopy based on the quantum imaging technique. This method allows us to
probe the sample with IR light, while the detection is shifted into the visible
or near-IR range. Thus, we demonstrate IR quantum imaging of the silicon chips
at different magnifications, wherein a sample is probed at 1550 nm wavelength,
but the detection is performed at 810 nm. We also analyze the possible
measurement conditions of the technique and estimate the time needed to perform
quality control checks of samples.
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