On-chip stencil lithography for superconducting qubits

• URL: http://arxiv.org/abs/2507.17005v1
• Date: Tue, 22 Jul 2025 20:31:21 GMT
• Title: On-chip stencil lithography for superconducting qubits
• Authors: Roudy Hanna, Sören Ihssen, Simon Geisert, Umut Kocak, Matteo Arfini, Albert Hertel, Thomas J. Smart, Michael Schleenvoigt, Tobias Schmitt, Joscha Domnick, Kaycee Underwood, Abdur Rehman Jalil, Jin Hee Bae, Benjamin Bennemann, Mathieu Féchant, Mitchell Field, Martin Spiecker, Nicolas Zapata, Christian Dickel, Erwin Berenschot, Niels Tas, Gary A. Steele, Detlev Grützmacher, Ioan M. Pop, Peter Schüffelgen,
• Abstract summary: organic resists commonly used for shadow evaporation of Josephson junctions (JJs) pose limitations due to residual contamination, poor thermal stability and compatibility under typical surface-cleaning conditions.<n>We developed an inorganic SiO$$/Si$_3$N$_4$ on-chip stencil lithography mask for JJ fabrication.<n>The stencil mask is resilient to aggressive cleaning agents and it withstands high temperatures up to 1200textC, thereby opening new avenues for JJ material exploration and interface optimization.
• Score: 0.0
• License: http://creativecommons.org/publicdomain/zero/1.0/
• Abstract: Improvements in circuit design and more recently in materials and surface cleaning have contributed to a rapid development of coherent superconducting qubits. However, organic resists commonly used for shadow evaporation of Josephson junctions (JJs) pose limitations due to residual contamination, poor thermal stability and compatibility under typical surface-cleaning conditions. To provide an alternative, we developed an inorganic SiO$_2$/Si$_3$N$_4$ on-chip stencil lithography mask for JJ fabrication. The stencil mask is resilient to aggressive cleaning agents and it withstands high temperatures up to 1200\textdegree{}C, thereby opening new avenues for JJ material exploration and interface optimization. To validate the concept, we performed shadow evaporation of Al-based transmon qubits followed by stencil mask lift-off using vapor hydrofluoric acid, which selectively etches SiO$_2$. We demonstrate average $T_1 \approx 75 \pm 11~\SI{}{\micro\second}$ over a 200 MHz frequency range in multiple cool-downs for one device, and $T_1 \approx 44\pm 8~\SI{}{\micro\second}$ for a second device. These results confirm the compatibility of stencil lithography with state-of-the-art superconducting quantum devices and motivate further investigations into materials engineering, film deposition and surface cleaning techniques.

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