T centres in photonic silicon-on-insulator material
- URL: http://arxiv.org/abs/2103.03998v1
- Date: Sat, 6 Mar 2021 00:34:51 GMT
- Title: T centres in photonic silicon-on-insulator material
- Authors: E. R. MacQuarrie and C. Chartrand and D. B. Higginbottom and K. J.
Morse and V. A. Karasyuk and S. Roorda and S. Simmons
- Abstract summary: T radiation damage centres in silicon provide a promising photon-spin interface.
These defect centres have only been studied as ensembles in bulk silicon.
We demonstrate the reliable creation of high concentration T centre ensembles in the 220 nm device layer of silicon-on-insulator (SOI) wafers.
- Score: 0.0
- License: http://creativecommons.org/licenses/by/4.0/
- Abstract: Global quantum networks will benefit from the reliable creation and control
of high-performance solid-state telecom photon-spin interfaces. T radiation
damage centres in silicon provide a promising photon-spin interface due to
their narrow O-band optical transition near 1326 nm and long-lived electron and
nuclear spin lifetimes. To date, these defect centres have only been studied as
ensembles in bulk silicon. Here, we demonstrate the reliable creation of high
concentration T centre ensembles in the 220 nm device layer of
silicon-on-insulator (SOI) wafers by ion implantation and subsequent annealing.
We then develop a method that uses spin-dependent optical transitions to
benchmark the characteristic optical spectral diffusion within these T centre
ensembles. Using this new technique, we show that with minimal optimization to
the fabrication process high densities of implanted T centres localized
$\lesssim$100 nm from an interface display ~1 GHz characteristic levels of
total spectral diffusion.
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