Donor spins in silicon for quantum technologies

• URL: http://arxiv.org/abs/2009.04081v1
• Date: Wed, 9 Sep 2020 02:41:02 GMT
• Title: Donor spins in silicon for quantum technologies
• Authors: Andrea Morello, Jarryd J. Pla, Patrice Bertet, David N. Jamieson
• Abstract summary: We describe the use of ion-implanted donor spins in silicon for quantum technologies. We show how to fabricate and operate single-atom spin qubits in silicon. We discuss pathways to scale up these qubits to build large quantum processors.
• Score: 0.0
• License: http://arxiv.org/licenses/nonexclusive-distrib/1.0/
• Abstract: Dopant atoms are ubiquitous in semiconductor technologies, providing the tailored electronic properties that underpin the modern digital information era. Harnessing the quantum nature of these atomic-scale objects represents a new and exciting technological revolution. In this article we describe the use of ion-implanted donor spins in silicon for quantum technologies. We review how to fabricate and operate single-atom spin qubits in silicon, obtaining some of the most coherent solid-state qubits, and we discuss pathways to scale up these qubits to build large quantum processors. Heavier group-V donors with large nuclear spins display electric quadrupole couplings that enable nuclear electric resonance, quantum chaos and strain sensing. Donor ensembles can be coupled to microwave cavities to develop hybrid quantum Turing machines. Counted, deterministic implantation of single donors, combined with novel methods for precision placement, will allow the integration of individual donors spins with industry-standard silicon fabrication processes, making implanted donors a prime physical platform for the second quantum revolution.

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