Sub-10 nm precision engineering of solid-state defects via nanoscale
aperture array mask
- URL: http://arxiv.org/abs/2112.00943v1
- Date: Thu, 2 Dec 2021 02:46:14 GMT
- Title: Sub-10 nm precision engineering of solid-state defects via nanoscale
aperture array mask
- Authors: Tae-yeon Hwang, Junghyun Lee, Seong-Woo Jeon, Yong-Su Kim, Young-Wook
Cho, Hyang-Tag Lim, Sung Moon, Sang-Wook Han, Yong-Ho Choa, and Hojoong Jung
- Abstract summary: Engineering a strongly interacting uniform qubit cluster would be a major step towards realizing a scalable quantum system for quantum sensing, and a node-based qubit register.
For a solid-state system that uses a defect as a qubit, various methods to precisely position defects have been developed, yet the large-scale fabrication of qubits within the strong coupling regime at room temperature continues to be a challenge.
In this work, we generate nitrogen vacancy (NV) color centers in diamond with sub-10 nm scale precision by using a combination of nanoscale aperture arrays (NAAs) with a high aspect ratio of 10 and a secondary E
- Score: 2.0972270756982536
- License: http://creativecommons.org/licenses/by/4.0/
- Abstract: Engineering a strongly interacting uniform qubit cluster would be a major
step towards realizing a scalable quantum system for quantum sensing, and a
node-based qubit register. For a solid-state system that uses a defect as a
qubit, various methods to precisely position defects have been developed, yet
the large-scale fabrication of qubits within the strong coupling regime at room
temperature continues to be a challenge. In this work, we generate nitrogen
vacancy (NV) color centers in diamond with sub-10 nm scale precision by using a
combination of nanoscale aperture arrays (NAAs) with a high aspect ratio of 10
and a secondary E-beam hole pattern used as an ion-blocking mask. We perform
optical and spin measurements on a small cluster of NV spins and statistically
investigate the effect of the NAAs during an ion-implantation process. We
discuss how this technique is effective for constructing a scalable system.
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